Treatment | Ï„ avg (s) | n | E (%) | |
---|---|---|---|---|
Control | D - A | 18.3 ± 0.5 | 55 | 14.9 ± 1.2 |
D + A | 21.5 ± 0.7 | 54 | ||
SST (1 nM) | D - A | 18.6 ± 0.4 | 58 | 11.4 ± 1.4* |
D + A | 21 ± 0.5 | 56 | ||
SST (50 nM) | D - A | 18.8 ± 0.4 | 59 | 12.1 ± 1.1 |
D + A | 21.4 ± 0.4 | 60 | ||
SST (1 μM) | D - A | 19.6 ± 0.6 | 57 | 10.9 ± 1.6* |
D + A | 22 ± 0.2 | 55 | ||
L-779976 (10 nM) | D - A | 20.7 ± 0.3 | 56 | 10.4 ± 1.5* |
D + A | 23.1 ± 0.3 | 59 | ||
L-779976 (100 nM) | D - A | 20.3 ± 0.4 | 58 | 12.1 ± 1.2 |
D + A | 23.1 ± 0.4 | 54 | ||
L-796778 (25 nM) | D – A | 19.5 ± 0.9 | 59 | 12.9 ± 1.7 |
D + A | 22.4 ± 0.7 | 54 | ||
L-796778 (50 nM) | D - A | 20.8 ± 0.5 | 60 | 8 ± 1.2* |
D + A | 22.6 ± 0.6 | 57 | ||
L-779976 (10 nM) + L-796778 (25 nM) | D - A | 19.6 ± 0.5 | 55 | 11.3 ± 0.9* |
D + A | 22.1 ± 0.2 | 54 | ||
L-779976 (100 nM) + L-796778 (25 nM) | D - A | 19.6 ± 0.5 | 57 | 12.9 ± 1.4 |
D + A | 22.5 ± 0.5 | 54 |